zirconium sputtering target low density

high purity 99.95% zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, ...

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main c...

Zirconium Sputtering Targets, High Quality Cylindrical Targets Zirconium Sputtering Targets Description Zirconium Sputtering Targets (Zr) is a silver ...

high quality pure titanium Gr1 Gr2 titanium disc sputtering target The target material is the target material bombarded by high-speed charged particle...

Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are use...

10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo...

Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorp...

Lanthanum sputtering target is a high-purity functional material widely used in semiconductors, optical coatings, and research fields. The product is ...

Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomiz...

Titanium Tube Target Vacuum Coating Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840 Item name Titanium tube target Size φ133*φ125*840 Grade Gr1 Pac...

Molybdenum Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenu...

High Toughness Magnesium Alloys Tubes For Aircrafts With Low Density Introduction: A magnesium alloy formed by adding alloying elements to magnesium b...

9*26*8mm Long Life ZrO2 Ceramic Bearing 629 High Temperature Product Description ZrO2 Ceramic Bearing 1. Bearing configuration: Zirconium Oxide (ZrO2)...

Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melt...

Certification CE, ISO Condition New Machine Type Magnetron Sputtering Chamber Size Can Be Customized According to Details Requirement Application Sani...

high purity metal sputtering targets molybdenum target for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10...

1.6-1.8mm Zirconium Silicate Beads ZrO2 65% High Grinding Efficiency Zirconium Silicate beads is produced by sintering method, with good roundness, an...

Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.5...