20mm Molybdenum Sputtering Targets For The Semiconductor Industry Molybdenum Target Molybdenum Disc molybdenum products

Molybdenum Sputtering Targets For The Semiconductor Industry

1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry:

Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets, including pure molybdenum targets, molybdenum titanium targets, molybdenum tantalum targets, and molybdenum alloy targets (such as TZM plate).

The materials used for semiconductors include pure metal targets such as tungsten, molybdenum, niobium, titanium, and silicon, additionally to substances like oxides or nitrides. As crucial as the deposition operating parameters that engineers and scientists perfect throughout the coating process are the material selection procedure.

2. Size Of Molybdenum Sputtering Targets For The Semiconductor Industry:

Thickness : <20mm

Diameter: <300mm

Surface: Polished

Standard: ASTM B386

Other size can be processed according to customer's drawing.

3. Chemical Content Of Molybdenum Sputtering Targets For The Semiconductor Industry:

5. Features Of Molybdenum Sputtering Targets For The Semiconductor Industry:

The sputtered coating adheres to the substrate better than conventional deposition techniques, and materials with very high melting temperatures, like molybdenum and tungsten, are very simple to sputter. Additionally, whereas evaporation can only be done from bottom to top, sputtering can be done both ways.

Sputtering targets are frequently rounded or rectangular, although there are also square and triangular options available. The substrate is the item that needs to be coated, and it might be anything from solar cells to optical components to semiconductor wafers. The coating typically ranges in thickness from angstroms to microns. The membrane may consist of a single material or several materials stacked in layers.

High purity, high density, fine, and consistent grain properties are present in molybdenum sputtering targets, resulting in extremely high sputtering efficiency, homogeneous film thickness, and a clean etching surface throughout the sputtering process.

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Shaanxi Peakrise Metal Co., Ltd. is an rich experienced tungsten,molybdenum, tantalum, niobium, titanium,zirconium,nickel non-ferrous metal production enterprise,main products include tungsten-copper alloy, molybdenum-copper alloy, tungsten-molybdenum alloy, high specific gravity tungsten alloy, tantalum alloy,niobium alloy,titanium alloy and other more than 100 kinds of products.In 2010, with the surge in export sales of products in this industry, we began to focus on foreign trade export business,provide high-quality non-ferrous metal products for the international market.After years of development,at present, it has become a comprehensive non-ferrous metal production enterprise integrating manufacturing and processing, material research and development, product testing, and stock inventory.The development of nearly ten years reminds us that high-quality products and services are always our top priority,at the same time, we continue to expand into new fields and provide high-quality products and services for more domestic and global customers.Products are exported to Taiwan, Ukraine, South Korea, the United States, Australia, Germany, Iran and other countries, and have established long-term good cooperative relations with customers. Our products are highly recognized and evaluated by customers.

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