99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density

Brand Name:GNEE
Certification:ISO 9001
Model Number:TiP0001
Minimum Order Quantity:10 pieces
Delivery Time:5-8 work days
Payment Terms:L/C, D/A, D/P, T/T, Western Union, MoneyGram
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Verified Supplier
Location: Anyang Henan China
Address: 25th Floor, Huafu Commercial Center, Wenfeng District, Anyang City,Henan Province
Supplier`s last login times: within 36 hours
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Product Details

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target

Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium alloy has good heat resistance and can be used for a long time at 600℃ or higher temperature.


Impurity Content
Ratios
Ti-75Al at%
Ti-70Al at%
Ti-67Al at%
Ti-60Al at%
Ti-50Al
at%
Ti-30Al
at%
Ti-20Al
at%
Ti-14Al
at%
Purity (%)
99.7
99.7
99.7
99.7
99.8/99.9
99.9
99.9
99.9
Density
(g/cm3)
3.1
3.2
3.3
3.4
3.63/3.85
3.97
4.25
4.3
Grain Size (µm)
100
100
100
100
100/-
-
-
-
Production
HIP
HIP
HIP
HIP
HIP/VAR
VAR
VAR
VAR


We supply various sputtering targets such as metals ,alloys, ceramic materials ,which are applicated in the field of Glass Coating, Optical Coating, Solar Cell Coating,Data Storage and Semiconductors.Besides supplying materials,we also offer custom products. Free free to contact us for more information.We also supply Research Materials to assist our customers in the Research and Development fields.

China 99.99%  Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target  Low Density supplier

99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density

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