purity sputtering target

Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals...

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybden...

High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating A gold sputtering target is a disc-shaped material made of high-purity gol...

99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest...

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 1. Specifications Of Sputter Coating Tantalum Target: Sputter Coating Tantalum Target...

High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets ar...

Ti Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 ti...

Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target includ...

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/15...

Titanium Target Sputtering Coating Titanium High Purity Titanium Target Purity 99.99% Titanium Target Sputtering target (purity: 99.9%-99.999%)Square ...

10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo...

high purity molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high den...

Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating Description: 1. An important w...

Tantalum target Tantalum products Tantalum alloy target Product details Commodity: Tantalum target Purity: ≥99.9% Table.Ⅰ.Chemical composition: Chemis...

DC Magnetron Sputtering Coating Machine / DC Sputtering System Magnetron Sputtering Models: DC Sputtering, MF Sputtering, RF Sputtering What is DC Spu...

High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputter...

Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target ...

Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, ...

Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.5...

Torich 133*4*4113mm 304L Alloy Sputtering Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tole...