CNC Rhodium Metal Sputtering Target Purity 95% For Liquid Crystal Display

Brand Name:QUALITY METALS
Certification:ISO9001:2015 certification
Model Number:CDX--TB-2021023
Minimum Order Quantity:Samples available
Delivery Time:5-35 working days
Place of Origin:China
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Location: Baoji Shaanxi China
Address: GAOYA INTERSECTION, BAOTAI ROAD GAOXIN DISTRICT, BAOJI SHAANXI CHINA
Supplier`s last login times: within 25 hours
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Product Details

Titanium Target Sputtering Coating Titanium High Purity Titanium Target Purity 99.99% Titanium Target

Sputtering target (purity: 99.9%-99.999%)Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target

PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target

★ Material
Titaniumtitanium grade 1
Key wordsTitanium sputtering target
Titanium sputtering target , target pure titanium target, MMO Coating Titanium Anode
Application:
◆ liquid crystal display, laser memory,
◆ Electronic controller sputtering thin film material,
◆ Semiconductor integrated circuits,
◆ Solar photovoltaic, Recording medium,
◆Flat display, Workpiece surface coating etc..


Tolerance+/-0.01mm
SurfacePolished, Cleaning, CNC lathe surface, Pickled, bright
Dimensionsaccording customer’s request.
Ti content(%)99.96% 99.98% 99.99%
Density4.51g/cm3
Colortitanium original color
Services: CNC , machining, turning, milling, stamping, casting, drilling, grinding, threading etc.


100% quality inspection


Clean the surface to avoid defects such as oil stains, scratches, etc.


Packing


Terms of tradeEXW, FOB, CIF
Terms of paymentT/T, L/C
Packingplastic paper inside, plywood case outside.
Quality controlUltrasonic testing & material test report
Delivery time7-30 days
MOQSmall order quantity is acceptable.
Business TypeManufacturer, Foreign Trading

Sputtering targets include metals, alloys, and ceramic compounds.
Sputtering is one of the main techniques for preparing thin-film materials. It uses ions generated by an ion source to accelerate and accumulate in a vacuum to form a high-speed energy ion beam, which bombards the solid surface, and exchanges kinetic energy between the ions and the atoms on the solid surface. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the sputtering deposition film, which is called the sputtering target. Various types of sputtered thin film materials have been widely used in semiconductor integrated circuits, solar photovoltaics, recording media, flat displays, and surface coatings of workpieces.
High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)
Magnetron sputtering coating is a new physical vapor deposition method, which uses an electron gun system to emit and focus electrons on the plated material, so that the sputtered atoms follow the momentum conversion principle and fly away from the material to the substrate with high kinetic energy to form a film. This plated material is called sputtering target.


Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.

China CNC Rhodium Metal Sputtering Target Purity 95% For Liquid Crystal Display supplier

CNC Rhodium Metal Sputtering Target Purity 95% For Liquid Crystal Display

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