what is sputtering process

Full industrial chain manufacturer Guangzhou UMore Film Technology Co., Ltd., established in 2010, is a professional PPF manufacturer integrating deve...

... targets are source materials used to deposit thin films through the . These targets are manufactured by met...

... diameters, thicknesses and purities available to suit all major source manufacturers. If you require a custom geometry, purity or design t...

... are cleaned via ion bombardment and heated.​ 3.: Argon gas is injected into the chamber; high voltage ionizes argon into plasma....

... System / PVD Au Gold Coating Machine Gold Coated Glass Slides and Silicon Wafers use the PVD of DC magnetron i...

... beam or ion beam, just like the target is hit, so the material used in the is called the " target". From metal titani...

... Target For Coating Introduction of Molybdenum Target Product Name Purity Density Surface Mo target 99.95% 10.22g/c...

Silicon Dioxide Sputtering Target With Fine Grinding Surface Processed By CNC Quartz glass SiO2 also called silica glass is a very important material ...

... deposition is a physical vapor deposition (PVD) method of thin film deposition by . This involves ejecting material from a "targe...

... targets are made from pure molybdenum (Mo) metal. Density: Molybdenum has a high density, typically ranging from 10.2 to 10.3 grams per cub...

... vacuum magnetron technology and nano-ceramic composite materials, designed for drivers who demand ultimate heat insulation, optical-gra...

....7mm x Width < 600mmx Length < 2000mm Purity: >=99.95% or 99.99% Surface: bright,polished Condition: annealed We can also according to...

...plane target, multi-arc target, step target, special-shaped target Applicable equipment: magnetron equipment, ion instrument,...

... chamber: ∮100mm; 130mm High. --Specimen stage size: ∮40mm( Hold 6 specimen cups) --Golden target size: ∮58mm*0.12mm(thickness) --Vacuum ...

...-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The -ion pump is main pump of oil less ultra-high...

17 Inch Anti-finger Print Pcap GFF Structure Touch Panel Sputtering an ITO Pattern 1. Product Description Master Touch GFF projected capacitive touch ...

...4n Disc High Purity Ti Metal Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of ...

Ceramic Sputtering Target Product Introduction: Various ceramic target materials produced by vacuum hot pressing sintering method have advanced techno...