sputtering target molybdenum

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybden...

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybden...

3N5 99.95% Molybdenum Plate Sputtering Target For Vacuum Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Proc...

Polished surface Molybdenum Round Sputtering Target Metal For PVD Molybdenum is a silver-white metal, hard and tough, high melting point, high thermal...

Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomiz...

Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are use...

High purity pvd titanium sputtering target Metal target customized Sputtering target can be devided into rotating target, plane target, multi-arc targ...

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), al...

Lanthanum tungsten electrode rod customized outlet high purity USES: - For ion implantation processing parts - For sputtering targets - source parts a...

Lanthanum sputtering target is a high-purity functional material widely used in semiconductors, optical coatings, and research fields. The product is ...

Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging...

high purity molybdenum target molybdenum rotatry tube target molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide d...

Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target includ...

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tu...

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/15...

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main c...

Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square...

High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputter...