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1 - 10 Results for tantalum sputtering target from 720 Products
High-Purity Tantalum Sputtering Target（Ta Sputtering Target) for PVD
Tantalum Tantalum Sputtering Targets are sputtering targets made from high-purity tantalum (Ta) metal. Characterized by high purity, uniformity, and density, tantalum targets are essential for semiconductor fabrication, precision optical coatings, and advanced electronic device manufacturing. Tantalum......
Shenzhen APG Material Company Limited
Verified Supplier
HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target......
Baoji Lihua Nonferrous Metals Co., Ltd.
Verified Supplier
No. 3, Gaoya Industrial Park, Baotai Road, Gaoxin Development Zone, Baoji City, Shaanxi Province,China
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ......
TOBO STEEL GROUP CHINA
Verified Supplier
No.208,Lvdi Road,Baihe Town,Qingpu District,Shanghai,China
DIN2462 Stainless Steel Tubing For Planar Sputtering Target
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ......
TORICH INTERNATIONAL LIMITED
Verified Supplier
Suite 1604-3, Hongan Plaza, #258 Die Yuan Road, Yinzhou District, Ningbo City, China
99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion
...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between...
Zhenan Metallurgy Co., Ltd
Verified Supplier
Huafu Commercial Center, Wenfeng District, Anyang City, Henan Province, China
Molybdenum Planar Sputtering Targets
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
Verified Supplier
Luoyang National University Science and Technology Park
High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication
...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
Verified Supplier
Room 210, Kaidi Building, No. 688, Huajiang Road, Jiading District, Shanghai
Natural Compound Fused Silica Sputtering Target High Temperature Resistant
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
Verified Supplier
Jidong Industraial Park, Qianbaihujian, Yangfang Town, Changping District, Beijing, China
Tantalum Sputtering Coating Machine
... in many industries because of its good resistance to erosion. Sputtered tantalum films are widely used in the 1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be...
SHANGHAI ROYAL TECHNOLOGY INC.
Verified Supplier
819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum......
Baoji City Changsheng Titanium Co.,Ltd
Verified Supplier
No.26 Baotai Road, Weibin District, Baoji City
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