tungsten target

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For Vacuum Sputtering Coating 1. Description Of For Vacuum Sputtering Coating: What is a ? It is also k...

... Metal Alloy Round Ta W Tantalum Target Purity: TA-2.5W (99.75% tantalum, 2.5% ) TA-7.5W (99.25% pure tantalum, 7.5% pure ...

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Sputtering , WTi sputtering , The sputtering is an important substrate for the oxide fi...

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Rhenium Rhenium Alloy ,WRe X-ray we use method of solid-liquid mixture to improve the uniformity of rhenium, at...

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... Alloy /Titanium Sputtering /Ti alloy for coating Product name: Titanium Sputtering Materail: Pure Titanium Gr2 or tita...

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... imposed focal spot and a reinforced anode. A constant high dose yield during the entire tube life is ensured by the high density . ...