... layers grown on a Epitaxy substrate. They are used as a key building block in various electronic and optoelectronic devices. It typically use ...
Add to Cart
... components are key consumable and structural parts used in semiconductor front-end equipment. They are widely applied in Dry Etch, EPI, Dif...
Add to Cart
HTCVD Silicon Carbide(CVD SIC)epitaxy growth furnace This equipment is used for silicon carbide coating of carbon-based/ceramic-based materia,especial...
Add to Cart
2500℃ High-Temp Vacuum Furnace Induction Heating for Processing Description: The vertical deposition furnace is engineered for high-temperatur...
Add to Cart
... of the target material. It is also used for chemical vapor deposition of composite materials with hydrocarbon gas (such as C3H8, etc.) as carbon s...
Add to Cart
... (SSiC), reactive sintered silicon carbide (RBSC), chemical vapor deposition silicon carbide () 2, silicon carbide has a variety of properti...
Add to Cart
..., making it suitable for PECVD, MOCVD, and semiconductor processes with high reliability and low maintenance costs. Key Features Permanent ...
Add to Cart
... to process requirements, graphite components can also be coated with , PyC, or TaC, significantly extending the service life of graphite materi...
Add to Cart