State - Of - The - Art Piezoelectric Wafer Fabrication For MEMS And SAW Devices Advanced Processing Capabilities For Results

Brand Name:CQTGROUP
Certification:ISO:9001, ISO:14001
Model Number:Chip Foundry Services
Minimum Order Quantity:1 pcs
Delivery Time:1-4 weeks
Payment Terms:T/T
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Location: Hangzhou Shanghai China
Address: Room 1106, CIBC, No.198 Wuxing Rd, Hangzhou, P.R.China
Supplier`s last login times: within 30 hours
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State-of-the-Art Piezoelectric Wafer Fabrication for MEMS and SAW Devices Advanced Processing Capabilities for Results


We specialize in providing comprehensive chip foundry services, catering to clients who require high-quality wafer processing and fabrication. By simply providing design schematics and specifications, we deliver tailored solutions that meet your exact needs. Our extensive range of wafers includes Lithium Niobate (LiNbO), Lithium Tantalate (LiTaO), Single Crystal Quartz, Fused Silica Glass, Borosilicate Glass (BF33), Soda-Lime Glass, Silicon Wafers, and Sapphire, ensuring versatility for diverse applications.


Advanced Wafer Materials Portfolio‌
Our expertise spans industry-standard and exotic substrates:

  • Lithium Niobate (LiNbO₃, 4"-6" wafers)
  • Lithium Tantalate (LiTaO₃, Z-cut/Y-cut)
  • Single Crystal Quartz (AT-cut/SC-cut)
  • Fused Silica (Corning 7980 equivalent)
  • Borosilicate Glass (BF33/Schott Borofloat®)
  • Silicon (100/111 orientation, 200mm max)
  • Sapphire (C-plane/R-plane, 2"–8")

‌Core Fabrication Technologies‌

  1. ‌Lithography‌

    • Electron Beam Lithography (EBL, 10nm resolution)
    • Stepper Lithography (i-line, 365nm)
    • Proximity Mask Aligner (5μm alignment accuracy)
  2. ‌Etching‌

    • ICP-RIE (SiO₂/Si etch rate 500nm/min)
    • DRIE (Aspect ratio 30:1, Bosch process)
    • Ion Beam Etching (Angular uniformity <±2°)
  3. ‌Thin-Film Deposition‌

    • ALD (Al₂O₃/HfO₂, <1nm uniformity)
    • PECVD (SiNₓ/SiO₂, stress-controlled)
    • Magnetron Sputtering (Au/Pt/Ti, 5nm–1μm)
  4. ‌Wafer Bonding‌

    • Anodic Bonding (Glass-to-Si, 400°C/1kV)
    • Eutectic Bonding (Au-Si, 363°C)
    • Adhesive Bonding (BCB/SU-8, <5μm warpage)

‌Supporting Process Infrastructure‌

  • Precision Grinding (TTV <2μm)
  • CMP Polishing (Ra <0.5nm)
  • Laser Dicing (50μm kerf width)
  • 3D Metrology (White-light interferometry)
China State - Of - The - Art Piezoelectric Wafer Fabrication For MEMS And SAW Devices Advanced Processing Capabilities For Results supplier

State - Of - The - Art Piezoelectric Wafer Fabrication For MEMS And SAW Devices Advanced Processing Capabilities For Results

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