Titanium Sputtering Target Ti For Plating Ti Ti-Al Zr Cr for PVD coating
Brand Name:Changsheng
Certification:ISO 9001;2015
Model Number:ASTM
Minimum Order Quantity:50pcs
Delivery Time:10-15days
Payment Terms:L/C, D/A, D/P, T/T, Western Union, MoneyGram
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Baoji China
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No.26 Baotai Road, Weibin District, Baoji City
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Product Details
Description
Titanium Sputtering Targets are high-purity titanium materials used
in physical vapor deposition (PVD) and magnetron sputtering processes.
Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4.5 g/cm³), and excellent corrosion resistance.
It has a melting point of 1660°C and a vapour pressure of 10⁻⁴ Torr at 1,453°C, making it ideal for high-temperature and high-vacuum coating
applications.
Titanium’s mechanical strength, biocompatibility, and corrosion
resistance make it widely used in industries such as semiconductors, aerospace, medical devices, and decorative coatings.
When sputtered, titanium films can be oxidised into TiO₂, forming coatings for optical, insulating, or decorative purposes.
Product Details
Material: High Purity Titanium (99.5%, 99.995%)
Grades: Grade 1, Grade 2, Grade 5 (Ti-6Al-4V), Grade 7
Standards: ASTM B381, ASTM B265, ASTM F67, ASTM F136
Shapes Available: Discs, Rectangles, Custom Sizes
Applications: Decorative thin films, optical coatings, semiconductor layers, and
corrosion-resistant coatings
Chemical Composition (%)
| Grade | Fe (max) | O (max) | N (max) | C (max) | H (max) | Pd (max) | Al | V | Ni (max) | Mo (max) | Ti |
|---|---|---|---|---|---|---|---|---|---|---|---|
| Gr1 | 0.20 | 0.18 | 0.03 | 0.08 | 0.015 | — | — | — | — | — | Balance |
| Gr2 | 0.30 | 0.25 | 0.03 | 0.08 | 0.015 | — | — | — | — | — | Balance |
| Gr3 | 0.30 | 0.35 | 0.05 | 0.08 | 0.015 | — | — | — | — | — | Balance |
| Gr4 | 0.50 | 0.40 | 0.05 | 0.08 | 0.015 | — | — | — | — | — | Balance |
| Gr5 | 0.40 | 0.20 | 0.05 | 0.08 | 0.015 | — | 5.5–6.7 | 3.5–4.5 | — | — | Balance |
| Gr7 | 0.30 | 0.25 | 0.03 | 0.08 | 0.015 | 0.12–0.25 | — | — | — | — | Balance |
| Gr9 | 0.25 | 0.15 | 0.03 | 0.08 | 0.015 | — | 2.5–3.5 | 2.0–3.0 | — | — | Balance |
| Gr12 | 0.30 | 0.25 | 0.03 | 0.08 | 0.015 | — | 0.6–0.9 | 0.2–0.4 | — | — | Balance |
| Gr5-ELI / Gr23 | 0.25 | 0.13 | 0.03 | 0.08 | 0.0125 | — | 5.5–6.5 | 3.5–4.5 | — | — | Balance |
Physical Properties
| Grade | Tensile Strength (MPa, min) | Yield Strength (MPa, min) | Elongation (%) |
|---|---|---|---|
| Gr1 | 240 | 170 | 24 |
| Gr2 | 345 | 275 | 20 |
| Gr3 | 450 | 380 | 18 |
| Gr4 | 550 | 483 | 15 |
| Gr5 | 895 | 828 | 10 |
| Gr7 | 400 | 275 | 18 |
| Gr9 | 620 | 483 | 15 |
| Gr12 | 483 | 348 | 18 |
| Gr23 / Gr5-ELI | 793 | 759 | 10 |
Applications
Titanium sputtering targets are widely used across various industries for both functional and decorative thin-film coatings, including:
Semiconductor and Electronics Industry – Integrated circuits, memory devices, and microelectromechanical systems (MEMS)
Optical Coatings – TiO₂ thin films for beam splitters, mirrors, and anti-reflection coatings
Decorative Coatings – Watches, jewellery, and consumer electronics
Aerospace and Automotive – Protective and heat-resistant coatings
Biomedical Industry – Biocompatible layers for implants and surgical instruments
Solar and Energy Devices – Photocatalytic and conductive coatings
Related Sputtering Target Materials
Aluminium (Al) Targets: For semiconductor and thermal applications
Copper (Cu) Targets: For electrical and conductive coatings
Tin (Sn) Targets: For corrosion-resistant coatings
Zinc (Zn) Targets: For cathodic protection and battery components
Precious Metal Targets (Au, Ag, Pt): For high-conductivity and inert coating layers
Key Features
High purity up to 99.995%
Excellent adhesion and uniform film formation
Corrosion-resistant and thermally stable
Available in various grades and geometries
Complies with ASTM B381 / B265 / F67 / F136 standards
Titanium Sputtering Target Ti For Plating Ti Ti-Al Zr Cr for PVD coating
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