Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing

Brand Name:CSTI
Certification:ISO9001:2015
Model Number:20221110
Minimum Order Quantity:1piece
Delivery Time:7~20 work days
Payment Terms:T/T, L/C
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Verified Supplier
Location: Baoji China
Address: No.26 Baotai Road, Weibin District, Baoji City
Supplier`s last login times: within 1 hours
Product Details Company Profile
Product Details

The chromium sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable purity and density, and fine and uniform grains , Long service life and other advantages.

Purity: 99.5%~99.95%;

Forming process: hot isostatic pressing(HIP);

Conventional size: ID55*OD70*L, ID125*OD153*L, φ100*40mm, φ150*30mm, φ155*30, φ80*40mm, etc.;

Application: decorative coating, tool coating, flat display coating, thin film solar industry, flat panel display industry, energy-saving glass industry, optical coating industry (such as automobile rearview mirror coating), etc.

Product performance
Purity99.599.95
Density g/cm3≥7.12≥7.12
Grain size/μm≤100≤100
Total content of metallic impurities/ppm≤5000≤500
Thermal conductivity/W/m.K60100
Coefficient of thermal expansion/1/K8×10-68×10-6
Size/mmPlanar target≤1600×500≤1600×500
Rotating targetIntegral formingby HIP
Length≤4000
Thickness≤15
Integral formingby HIP
Length≤4000
Thickness≤15

Chromium 2N5 (Trace elements)PPM ≥7.12g/cm3

CompositionFeAlSiCSON
Standard≤1500≤1200≤1500≤200≤50≤1400≤300
Test values98030060062501200200

Chromium 2N8 (Trace elements)PPM ≥7.12g/cm3

CompositionFeAlSiCSON
Standard≤800≤300≤400≤200≤50≤1000≤100
Test values7407892845034030

Chromium 3N (Trace elements)PPM ≥7.12g/cm3

CompositionFeAlSiCSON
Standard≤500≤100≤150≤150≤30≤500≤100
Test values2904780902845050

Chromium 3N5 (Trace elements)PPM ≥7.12g/cm3

CompositionFeAlSiCuNiCSON
Standard≤100≤50≤50≤10≤50≤50≤30≤150≤80
Test values504540710242713730

Other targets can also be supplied

ItemPurityDensityCoating colorShapeStandard size
Titanium Aluminum(TiAl) Alloy target2N8-4N3.6-4.2Rose gold/coffee/champagne goldcylinder/planar(D)70/100*(H)100-2000mm

solar photovoltaic industry, decorative coatings industry, flat
panel display industry, architectural glass/automotive glass industry, flexible winding coating industry, optical data
storage industry, optical communication/optical industry and magnetic data storage as well as semiconductor industry

Pure chrome (Cr)target2N7-4N7.19gun grey/blackcylinder/planar(D)70/100*(H)100-2000mm
Pure Titanium(Ti) target2N8-4N4.51gold/rose gold/blue/rainbow/light black/gun greycylinder/planar(D)70/100*(H)100-2000mm
Pure Zirconium(Zr) target2N5-4N6.5light goldcylinder/planar(D)70/100*(H)100-2000mm
Pure Aluminium(Al) target4N-5N2.7silvercylinder/planar(D)70/100*(H)100-2000mm
Pure Nickel (Ni) target3N-4N8.9nickelcylinder/planar(D)70/100*(H)100-2000mm
Pure Niobium (Nb) target3N8.57whitecylinder/planar(D)70/100*(H)100-2000mm
Pure Tantalum(Ta) target3N516.4black/purecylinder/planar(D)70/100*(H)100-2000mm
Pure Molybdenum (Mo) target3N510.2blackcylinder/planar(D)70/100*(H)100-2000mm
Remarks: Size can be customizaed according to specical requirements

Product Advantage

01 High chemical purity

02 Low gas content

03 Close to 100% density

04 Uniform grains

05 Dense and homogeneous inner structure

Application Field

Solar photovoltaic industry
Decorative coatings industry
Flat panel display industry
Architectural glass/automotive glass industry
Flexible winding coating industry
Optical data storage industry
Optical communication/optical industry
Magnetic data storage as well as semiconductor industry

China Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing supplier

Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing

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