Semiconductor CdZnTe Substrate Used For Diodes And Transistors, Ir Optical Window Or Disks, Opitical Components

Brand Name:PAM-XIAMEN
Minimum Order Quantity:1-10,000pcs
Delivery Time:5-50 working days
Payment Terms:T/T
Place of Origin:China
Price:By Case
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Location: Xiamen Fujian China
Address: #506B, Henghui Business Center, No.77, Lingxia Nan Road, High Technology Zone, Huli, Xiamen 361006, China
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Semiconductor CdZnTe Substrate Used For Diodes And Transistors, Ir Optical Window Or Disks, Opitical Components

Product Description

Single crystal (Ge)Germanium Wafer

PAM-XIAMENoffers semiconductor materials,Ge(Germanium) Single Crystals and Wafers grown by VGF / LEC

General Properties of Germanium Wafer

General Properties StructureCubic, a = 5.6754 Å
Density: 5.765 g/cm3
Melting Point: 937.4 oC
Thermal Conductivity: 640
Crystal Growth TechnologyCzochralski
Doping availableUndopedSb DopingDoping In or Ga
Conductive Type/NP
Resistivity, ohm.cm>35< 0.050.05 – 0.1
EPD< 5×103/cm2< 5×103/cm2< 5×103/cm2
< 5×102/cm2< 5×102/cm2< 5×102/cm2

Grades and Application of Germanium wafer

Electronic GradeUsed for diodes and transistors,
Infrared or opitical GradeUsed for IR optical window or disks,opitical components
Cell GradeUsed for substrates of solar cell

Standard Specs of Germanium Crystal and wafer

Crystal Orientation<111>,<100> and <110> ± 0.5o or custom orientation
Crystal boule as grown1″ ~ 6″ diameter x 200 mm Length
Standard blank as cut1″x 0.5mm2″x0.6mm4″x0.7mm5″&6″x0.8mm
Standard Polished wafer(One/two sides polished)1″x 0.30 mm2″x0.5mm4″x0.5mm5″&6″x0.6mm

Special size and orientation are available upon requested Wafers

Specification of Germanium Wafer

ItemSpecificationsRemarks
Growth MethodVGF
Conduction Typen-type, p type, undoped
DopantGallium or Antimony
Wafer Diamter2, 3,4 & 6inch
Crystal Orientation(100),(111),(110)
Thickness200~550um
OFEJ or US
Carrier Concentrationrequest upon customers
Resistivity at RT(0.001~80)Ohm.cm
Etch Pit Density<5000/cm2
Laser Markingupon request
Surface FinishP/E or P/P
Epi readyYes
PackageSingle wafer container or cassette
4 inch Ge wafer Specificationfor Solar Cells
DopingP
Doping substancesGe-Ga
Diameter100±0.25 mm
Orientation(100) 9° off toward <111>+/-0.5
Off-orientation tilt angleN/A
Primary Flat OrientationN/A
Primary Flat Length32±1mm
Secondary Flat OrientationN/A
Secondary Flat LengthN/Amm
cc(0.26-2.24)E18/c.c
Resistivity(0.74-2.81)E-2ohm.cm
Electron Mobility382-865cm2/v.s.
EPD<300/cm2
Laser MarkN/A
Thickness175±10μm
TTV<15μm
TIRN/Aμm
BOW<10μm
Warp<10μm
Front facePolished
Back faceGround

Germanium Wafer Process

In the germanium wafer production process, germanium dioxide from the residue processing is further purified in chlorination and hydrolysis steps.

1)High purity germanium is obtained during zone refining.

2)A germanium crystal is produced via the Czochralski process.

3)The germanium wafer is manufactured via several cutting, grinding, and etching steps.

4)The wafers are cleaned and inspection. During this process, the wafers are single side polished or double side polished according to custom requirement, epi-ready wafer comes.

5)The wafers are packed in single wafer containers, under a nitrogen atmosphere.

Application:

Germanium blank or window are used in night vision and thermographic imaging solutions for commercial security, fire fighting and industrial monitoring equipment. Also, they are used as filters for analytical and measuring equipment, windows for remote temperature measurement, and mirrors for lasers.

Thin Germanium substrates are used in III-V triple-junction solar cells and for power Concentrated PV (CPV) systems.

China Semiconductor CdZnTe Substrate Used For Diodes And Transistors, Ir Optical Window Or Disks, Opitical Components supplier

Semiconductor CdZnTe Substrate Used For Diodes And Transistors, Ir Optical Window Or Disks, Opitical Components

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