Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity

Brand Name:High Purity Titanium Aluminium Zirconium Chrome Sputtering Target
Certification:ASTM
Model Number:plates
Minimum Order Quantity:Negotiable
Delivery Time:10-30days
Payment Terms:L/C, T/T
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High Purity Titanium Aluminium Zirconium Chrome Sputtering Target

We produce Titanium Aluminium Zirconium Chrome Sputtering Target high quality sputtering targets pure metal, alloy and ceramic materials.

FANMETAL Produces high-purity pure metal and alloy sputtering targets with the highest density and smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We typically use vacuum melting or hot isostatic pressing (HIP) for production. We choose the appropriate production process to create a product that meets your specific application requirements.

Our sputtering targets are in a comprehensive range, purity levels, shapes and sizes. For example, the most common target shapes include circular, rectangular, annular and tubular. Depending on the size of the target and the nature of the material, they can be single-segmented or multi-segmented. We can customize according to your needs.

Titanium Aluminium Zirconium Chrome Sputtering Target Specification

Product nameTitanium target for pvd coating machine
Grade

Titanium (Gr1, Gr2, Gr5, Gr7,GR12)

Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc

OriginHenan Province china
Titanium content≥99.5 (%)
Impurity content<0.02 (%)
Density4.51 or 4.50 g/cm3
StandardASTM B381; ASTM F67, ASTM F136

Size

1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;

2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm

3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm

4. Customized is available

TechniqueForged and CNC Machined
ApplicationSemiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry.
Feature

1. Low density, high gauge strength

2. Excellent corrosion resistance

3. Has good heat resistance

4. Excellent low temperature resistance

5. Non-magnetic and non-toxic

6. Good thermal performance


Titanium Aluminium Zirconium Chrome Sputtering Target Picture:


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99.8%99.99%99.8%99.8%

Nitride Ceramic Sputtering Target
MaterialsPurityInquiry
Aluminum Nitride (AlN) Sputtering targets2N5-3NInquiry
Chromium Nitride (Cr2N) Sputtering targets2N5-3NInquiry
Iron Nitride (FeN4) Sputtering targets3NInquiry
Niobium Nitride (NbN) Sputtering targets2N5Inquiry
Tantalum Nitride (TaN) Sputtering targets2N5Inquiry
Vanadium Nitride (VN) Sputtering targets2N5Inquiry
Zirconium Nitride (ZrN) Sputtering targets2N5Inquiry
Boron Nitride (BN) Sputtering targets2N5Inquiry
Germanium Nitride (Ge3N4) Sputtering targets3NInquiry
Hafnium Nitride (HfN) Sputtering targets2N5Inquiry
Silicon Nitride (Si3N4) Sputtering targets2N5-3NInquiry
Titanium Nitride (TiN) Sputtering targets2N5Inquiry
Zinc Nitride (Zn3N2)Sputtering targets3NInquiry

China Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity supplier

Titanium Aluminium Zirconium Chrome Sputtering Targets High Purity

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