Customized Size Sputtering Targets 6N Electrolytic Grade Copper Granular Evaporation Material

Brand Name:JINXING
Certification:ISO 9001
Model Number:Copper Sputtering Target
Minimum Order Quantity:1kg
Delivery Time:10~25 work days
Payment Terms:L/C, D/A, D/P, T/T, Western Union
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Copper Granular Ultra high purity 99.999%, 99.9999% Evaporation Material

6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits.


Purity: 99.999% ~ 99.9999%

For precise control of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm


The content of gas elements (C, O, N, H) is less than 1ppm

Main uses: 6N copper has some properties similar to gold, good conductivity, ductility, corrosion resistance and surface performance, and low softening temperature. As a new kind of material, high-purity copper is not only used in the preparation of high-purity analytical standard test materials, various connecting wires for electronic industry, bonding wires for electronic packaging, high-quality audio wires and integrated circuits, sputtering targets for liquid crystal display and ion coating, but also an indispensable and precious material in the atomic energy, rocket, missile, aviation, aerospace and metallurgical industries . As a new material, ultra pure copper has been paid more and more attention. In addition to the preparation of high-purity analytical standard test materials, various connecting wires for electronic industry, bonding wires for electronic packaging, high-quality audio wires and integrated circuits, sputtering targets and ion coating for liquid crystal display, high-quality audio circuits and other high-tech fields, high-purity copper is also used in atomic energy, rockets, missiles, aviation, space navigation and other fields Precious materials are indispensable in metallurgical industry. With the development of high and new technology and the need of strategic materials, high-purity metals have higher and higher requirements for purity. The preparation and application of high-purity and ultra-high-purity metals in modern materials science and engineering are new and growing fields.



Copper Granular 99.9999% , Copper Cylinder Target 99.999% are available in varying sizes

Sizes: 3x3mm , 6x6mm, 3x6mm etc


Plate sputtering targets:


Thickness: 0.04 to 1.40" (1.0 to 35mm).

Width up to 20"(50 to 500mm).

Length: 3.9" to 6.56 feet( 100-2000mm)

other sizes as requested.

Cylinder sputtering targets:


3.94 Dia. x 1.58"(100 Dia. x 40mm)

2.56 Dia. x 1.58" (65 Dia. x 40mm)

or 63*32mm other sizes as requested.


Tube sputtering targets:


2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

other sizes as requested.


Advantage:


1. Purity: 99.99% ~ 99.9999%

2. High density, no defects inside, even grains and smooth surface

3. Unique melting and casting pollution control process

4. It can meet the needs of customized alloy

5. Unique homogenization control technology of added elements

6. Unified microstructure control


High purity copper refers to metal copper with a purity of more than 4N. High purity copper has a very small grain boundary area, few lattice defects, some of its properties are similar to gold, with good conductivity, ductility, corrosion resistance and surface performance, while softening temperature is relatively low. High purity copper has high thermal conductivity and excellent processing performance at the base temperature. High purity copper is widely used in integrated circuit, electronic packaging, photovoltaic solar power technology and other fields. In recent years, with the development of high-tech industry, high-purity copper has been widely used. The preparation of high-purity copper is usually divided into two steps of purification and super purification. The preparation of high-purity copper generally takes crude copper as the raw material, and further removes the impurities to obtain 5n-7n high-purity copper. At present, the main methods of preparing high purity copper are area refining, anion exchange and electrolytic refining. The regional refining method is one of the main methods to prepare high-purity metals. At present, the regional refining methods of high-purity copper include floating regional refining method and desulfurization regional refining method

Product NameElementPurirtyMelting Point Density (g/cc)Available Shapes
High Pure SliverAg4N-5N96110.49Wire, Sheet, Particle, Target
High Pure AluminumAl4N-6N6602.7Wire, Sheet, Particle, Target
High Pure GoldAu4N-5N106219.32Wire, Sheet, Particle, Target
High Pure BismuthBi5N-6N271.49.79Particle, Target
High Pure CadmiumCd5N-7N321.18.65Particle, Target
High Pure CobaltCo4N14958.9Particle, Target
High Pure ChromiumCr3N-4N18907.2Particle, Target
High Pure CopperCu3N-6N10838.92Wire, Sheet, Particle, Target
High Pure FerroFe3N-4N15357.86Particle, Target
High Pure GermaniumGe5N-6N9375.35Particle, Target
High Pure IndiumIn5N-6N1577.3Particle, Target
High Pure MagnesiumMg4N6511.74Wire, Particle, Target
High Pure MagnesiumMn3N12447.2Wire, Particle, Target
High Pure MolybdenumMo4N261710.22Wire, Sheet, Particle, Target
High Pure NiobiumNb4N24688.55Wire, Target
High Pure NickelNi3N-5N14538.9Wire, Sheet, Particle, Target
High Pure LeadPb4N-6N32811.34Particle, Target
High Pure PalladiumPd3N-4N155512.02Wire, Sheet, Particle, Target
High Pure PlatinumPt3N-4N177421.5Wire, Sheet, Particle, Target
High Pure SiliconSi5N-7N14102.42Particle, Target
High Pure TinSn5N-6N2327.75Wire, Particle, Target
High Pure TantalumTa4N299616.6Wire, Sheet, Particle, Target
High Pure TelluriumTe4N-6N4256.25Particle, Target
High Pure TitaniumTi4N-5N16754.5Wire, Particle, Target
High Pure TungstenW3N5-4N341019.3Wire, Sheet, Particle, Target
High Pure ZincZn4N-6N4197.14Wire, Sheet, Particle, Target
High Pure ZirconiumZr4N14776.4Wire, Sheet, Particle, Target

China Customized Size Sputtering Targets 6N Electrolytic Grade Copper Granular Evaporation Material supplier

Customized Size Sputtering Targets 6N Electrolytic Grade Copper Granular Evaporation Material

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