Aluminum Al Sputtering Target 99.999% Ultra High Purity For Integrated Circuits

Brand Name:JINXING
Certification:ISO 9001
Model Number:Aluminum Sputtering Target
Minimum Order Quantity:1kg
Delivery Time:10~25 work days
Payment Terms:L/C, D/A, D/P, T/T, Western Union
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Aluminum Sputtering Target (Al) High purity 99.999%

High purity material, ultra-high purity material, semiconductor high purity material


Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...



Aluminum Sputtering Target 99.99% , Aluminum Sputtering Target 99.999% are available in varying sizes

D101.6x3.175mm , D101.6x6.35mm etc


Another important use of ultra-high purity aluminum is as wiring for integrated circuits. The trace impurities of uranium and thorium in ultra-high purity aluminum are as few as possible, because they are radioactive elements, which release α particles at all times, resulting in the failure of integrated circuits and program errors and confusion. U + Th < 5ppb (wt%) in 5n2 high purity aluminum and U + Th < 1ppb (wt%) in 5n5 ultra high purity aluminum. < 5ppb (wt%), in 5n5 ultra-high purity aluminum

5N and 5n5 large-scale plate targets are widely used in PDP and TFT-LCD flat panel displays and sputtering targets for solar cell coating.


In the field of superconductivity, ultra-high purity aluminum is used as the stabilizing material of superconducting cable.

In the field of electronics, 5N ultrapure aluminum is used to manufacture optoelectronic storage media, such as CD, CD-ROM, CD-RW, data disk or micro disk, DVD silver disk, etc., in which 5N ultrapure aluminum sputtering film is used as the light reflecting layer.


The impurity content of ultra pure aluminum is very little.

The low impurity content makes the ultra pure aluminum have some special properties.


The lower the content of impurity elements, the smaller the density of intermetallic compounds.


Use as a good conductor of electricity


The resistance in the very low temperature region is very small


High reflectivity to UV


Design freedom spread


It is highly resistant to corrosive gases and solutions


Product NameElementPurirtyMelting Point Density (g/cc)Available Shapes
High Pure SliverAg4N-5N96110.49Wire, Sheet, Particle, Target
High Pure AluminumAl4N-6N6602.7Wire, Sheet, Particle, Target
High Pure GoldAu4N-5N106219.32Wire, Sheet, Particle, Target
High Pure BismuthBi5N-6N271.49.79Particle, Target
High Pure CadmiumCd5N-7N321.18.65Particle, Target
High Pure CobaltCo4N14958.9Particle, Target
High Pure ChromiumCr3N-4N18907.2Particle, Target
High Pure CopperCu3N-6N10838.92Wire, Sheet, Particle, Target
High Pure FerroFe3N-4N15357.86Particle, Target
High Pure GermaniumGe5N-6N9375.35Particle, Target
High Pure IndiumIn5N-6N1577.3Particle, Target
High Pure MagnesiumMg4N6511.74Wire, Particle, Target
High Pure MagnesiumMn3N12447.2Wire, Particle, Target
High Pure MolybdenumMo4N261710.22Wire, Sheet, Particle, Target
High Pure NiobiumNb4N24688.55Wire, Target
High Pure NickelNi3N-5N14538.9Wire, Sheet, Particle, Target
High Pure LeadPb4N-6N32811.34Particle, Target
High Pure PalladiumPd3N-4N155512.02Wire, Sheet, Particle, Target
High Pure PlatinumPt3N-4N177421.5Wire, Sheet, Particle, Target
High Pure SiliconSi5N-7N14102.42Particle, Target
High Pure TinSn5N-6N2327.75Wire, Particle, Target
High Pure TantalumTa4N299616.6Wire, Sheet, Particle, Target
High Pure TelluriumTe4N-6N4256.25Particle, Target
High Pure TitaniumTi4N-5N16754.5Wire, Particle, Target
High Pure TungstenW3N5-4N341019.3Wire, Sheet, Particle, Target
High Pure ZincZn4N-6N4197.14Wire, Sheet, Particle, Target
High Pure ZirconiumZr4N14776.4Wire, Sheet, Particle, Target

China Aluminum Al Sputtering Target 99.999% Ultra High Purity For Integrated Circuits supplier

Aluminum Al Sputtering Target 99.999% Ultra High Purity For Integrated Circuits

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