Jinxing Chromium Sputtering Target High Purity Evaporation Materials
Brand Name:JINXING
Certification:ISO 9001
Model Number:Chromium Evaporation Material
Minimum Order Quantity:1kg
Delivery Time:10～25 work days
Payment Terms:L/C, D/A, D/P, T/T, Western Union
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Chromium Evaporation Material 99.5%, 99.9%, 99.95%
Evaporation coating is to heat the evaporated material with evaporator under vacuum or atmosphere to make it evaporate. The evaporated particles flow directly to the substrate and deposit on the substrate to form solid film.
Vacuum evaporation coating is an earlier technology and widely used. From the condition of coated particles, evaporation coating is not as good as sputtering and ion plating, but vacuum evaporation technology still has many advantages, such as relatively simple equipment and process, deposition of very pure film, preparation of film with specific structure and properties, etc. It is still a very important coating technology today. In fact, evaporation plating technology has formed an expanding industry, which is widely used in various industries and occupies an important position.
There are many kinds of evaporation coating materials. At present, there are hundreds of them are mainly used in the market. The production process mainly includes: Crystal crushing, melting crushing, wire drawing, wire cutting, granulation, pulverizing, tablet pressing, casting, molding, etc. The product shape mainly includes: wire rod, powder, irregular particle, small cylinder, small ball, cone
Chromium evaporation material, Chromium coating material are available in varying sizes
Generally, the evaporation material heats the target to evaporate the surface components in the form of atomic groups or ions, and settles on the substrate surface, forming the film through the film forming process (scattered island structure stray structure layer growth).
| Grades: | Chrome Sputtering target |
| Purity: 99.5%, 99.9%, 99.95% | |
| Size | 3x3mm, 6x6mm |
| Density: | 7.19g/cm3 |
| Shape: | sheets, granular |
The main products are :
as follows: (particles, blocks and powders can be customized) aluminum particles 99.99% 3 * 3mm; 99.999% 3 * 3mm copper particles 99.99% 3 * 3mm; 99.999% 3 * 3mm iron particles 99.9% 2 * 3mm titanium particles 99.999% 6 * 6mm vanadium particles 99.9% 3 * 3mm nickel particles 99.999% 6 * 6mm chromium particles 99.95% 3-5mm cobalt particles 99.95% 2-8mm manganese particles 99.8% 1-10 mm barium particles 99.6% 2-6cm (as deoxidizer) Calcium particles 99.5% 1-3mm (used as deoxidizer) tungsten particles 99.95% 6 * 6mm niobium particles 99.95% 6 * 6mm molybdenum particles 99.95% 6 * 6mm tantalum particles 99.95% 6 * 6mm zirconium particles 99.5% 1.6 * 5mm; 99.95% 2.4 * 5mm crystal hafnium rods 99.9% d21mm hafnium particles 99.9%.
High purity aluminum Al, high purity copper Cu, high purity titanium Ti, high purity silicon Si, high purity gold Au, high purity silver AG, high purity indium in, high purity magnesium mg, high purity zinc Zn, high purity platinum Pt, high purity germanium Ge, high purity nickel Ni, High purity tantalum TA, gold germanium alloy Auge, gold nickel alloy auni, nickel chromium alloy NiCr, titanium aluminum alloy TiAl, copper indium gallium alloy cuinga, copper indium gallium selenium alloy CuInGaSe, zinc aluminum alloy ZnAl, aluminum silicon alloy AlSi and other metal coating materials.
| Type | Application | Main alloy | Request |
| Semiconductor | Preparation of core materials for integrated circuits | W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N | Highest technical requirements, ultra-high purity metal, high precision size, high integration |
| Screen Display | Sputtering technology ensures uniformity of film production, improves productivity and reduces cost | Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target | High technical requirements, high-purity materials, large material area and high degree of uniformity |
| Decorate | It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance | Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target | mainly used for decoration, energy saving, etc |
| Tooling | Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts | TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc | High performance requirements and long service life |
| Solar photovoltaic | Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells | Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc | Wide Application |
| Electronic accessories | For film resistance and film capacitance | NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc | Small size, good stability and small resistance temperature coefficient are required for electronic devices |
| Information storage | For making magnetic memory | Cr based, Co based, CO Fe based, Ni based alloys | High storage density, high transmission speed |
Jinxing Chromium Sputtering Target High Purity Evaporation Materials
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