Home /Oxide /

Colloidal Silica For Fine Polishing Metal And Stainless Steel Workpiece

Colloidal Silica For Fine Polishing Metal And Stainless Steel Workpiece

Brand Name:SIGNI
Payment Terms:T/T,L/C,PAYPAL,WEST UNION
Place of Origin:shanghai
Packaging Details:CARTON
color:as per clients' request
packing:plastic bottle
Contact Now

Add to Cart

Verified Supplier
Address: NO. 439 JINGLIAN RD, SHNAGHAI,CHINA 201108
Supplier`s last login times: within 1 hours
Shipping
lt's easy to get a shipping quote! Just click the button below and complete the short form.
Get Shipping Quote
Product Details Company Profile
Product Details

Colloidal Silica for Fine Polishing metal and stainless steel workpiece


Colloidal Silica for Fine Polishing


Our advantages:
1. A whole series of products
2. Premium quality of products
3. Strong R & D strength
4. A high efficient professional team
5. Reasonable price and excellent service
6. On time delivery, zero failure


Silicon Oxide Slurry

Silicon oxide slurries are achieved with silicon dioxide particles fully dispersed in the liquid with the available sizes as follows:

Size(nm )
20
40
60
80
100
120
140

The technical data of SiO2 slurry is as below

Appearance:Milk white liquid

Content(SiO2%): 40%±2%

pH value: 10±0.5

Specific gravity(20℃): 1.25-1.30

Viscosity(20℃): less than 10 c.p

1. Appearance

Milk white


2. Chemical composition

 (1)  Good polishing effect: less impurity and contamination on the
polishing surface, easily to clean, high surface finishing, low
surface roughness, no scratch;  
 (2)  Easily to use: suitable for general polishing process, and can
be directly used or use after diluted with deionized water;  
 (3)  High removal rate: adopt advanced CMP technology for
super-hard materials, to improve the polishing efficiency and save
processing time.  
    
3. Application
Lapping and Polishing SiC, sapphire substrate wafer, etc.

4. Operating requirements
(1) Directly use
(2) Mixture ratio of suspension and deionized water is 1:1-1:5.

5. Package: 20Kg/ barrel

6. Announcements
(1) Storage condition: Proper temperature 5°C-30°C, avoid solarization
(2) Storage time: one year

Specifications


1.Diamond slurry manufacturer for ten years
2.Lot-to-lot Consistency
3.Diamond slurry with ISO9001 certificate

Diamond Suspension for metal polishing


Our diamond slurries are made with diamond particles completely dispersed in the mixed liquids. They have fine chemical-mechanical performance and are widely used for lapping and precision polishing of wafer substrates, compound crystals, optical devices, LCD, gems, metallic works, etc.


CLASSIFICATIONS & MAIN APPLICATION FIELD

  1. PDS Polycrystaline Diamond Slurry
  2. MDS Monocrystaline Diamond Slurry
  3. QDS Quasi Poly diamond slurry
  4. NDS Nano Diamond Slurry

POLYCRYSTALINE DIAMOND SLURRY(PDS)


CHARACTERISTICS


1. Fine polycrystaline diamond materials.


(1) Superhigh cutting force and surface finish in the processing of high hardness wafers.


(2)Different carriers are suitable for different fields.


Size(μm)0.250.50-11-32-44-8
MediumWater/OilWater/OilWater/OilWater/OilWater/OilWater/Oil

MONOCRYSTALINE DIAMOND SLURRY(MDS)


CHARACTERISTICS
1. Fine particle shapes.

  1. Strict size control.
  2. Unique compound design for different application fields.

AVAILABLE SIZES(Ref Poly specs)


QUASI POLY DIAMOND SLURRY(QDS)


CHARACTERISTICS
1. Economical alternatives of PDS.
2. Similar polishing effects with PDS in the processing of kinds of semiconductor chips.


Size(μm)MediumSize(μm)MediumSize(μm)Medium
0.05Water/Oil0-1Water/Oil8-16Water/Oil
0.08Water/Oil1-2Water/Oil10-20Water/Oil
0.1Water/Oil1-3Water/Oil20-30Water/Oil
0.2Water/Oil2-4Water/Oil30-40Water/Oil
0.25Water/Oil4-8Water/Oil40-60Water/Oil
0.5Water/Oil6-12Water/Oil

NANO DIAMOND SLURRY(NDS)


CHARACTERISTICS
1. Unique loose structure of spherical crystallite of nano diamond.
2. Superfine dispersing effects because of unique ultra-dispersing techniquee.
3. Angstrom-level accuracy surface finish.


Size(μm)5080100150200300400500
MediumWater/OilWater/OilWater/OilWater/OilWater/OilWater/OilWater/OilWater/Oil

  
Diamond Slurry For Polishing

Our diamond slurries are made with diamond particles completely dispersed in the mixed liquids. 3 series according to the constituents:


Monocrystaline Diamond Slurry(MDL):Good removal effects, suitable for lapping & polishing of hard material.


PolycrystalineDiamond Slurry(PDL): Superb tenacity & self-sharpening features. Suitable for lapping and polishing of precision metal material, optical crystals, ceramics and hard materials.


Nano Diamond Slurry(NDL): Good dispersing stability & suitable for precise surface treatment.
ultra-dispersing effect Nano diamond slurry(NDS) lapping and precision polishing

Specifications

  
1.Widely used for lapping and precise polishing.
2.Fine chemical-mechanical performance.
3.Water or oil basis

Our diamond slurries are made with diamond particles completely dispersed in the mixed liquids. They have fine chemical-mechanical performance and are widely used for lapping and precision polishing of wafer substrates, compound crystals, optical devices, LCD, gems, metallic works, etc.


CLASSIFICATIONS & MAIN APPLICATION FIELD

PDS Polycrystaline Diamond


Characteristics:

★ Unique loose structure of spherical crystalline of nano diamond.

★ Superfine dispersing effects because of unique ultra-dispersing technique.

★ Angstrom-level accuracy surface finish.

Available Sizes:

Size(nm)

50
80
100
150
200
300
400
500
Media
Water / oil
Water / oil
Water / oil
Water / oil
Water / oil
Water / oil
Water / oil
Water / oil

Remarks: Special sizes can be tailor-made.

Application:

1, Semiconductor wafer polishing: monocrystalline silicon wafer, polycrystalline silicon wafer, sapphire wafer, SiC wafer, etc..

2, Magnetic recording materials polishing: computer hard disk substrate, computer hard disk head.

China Colloidal Silica For Fine Polishing Metal And Stainless Steel Workpiece supplier

Colloidal Silica For Fine Polishing Metal And Stainless Steel Workpiece

Inquiry Cart 0