Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine
Brand Name:SHENHUA
Certification:CE,UL
Model Number:CMC-800
Minimum Order Quantity:1 set
Delivery Time:30~40 days
Payment Terms:L/C, T/T, D/P, Western Union, Paypal, Money Gram
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Verified Supplier
Location:
Dongguan Guangdong China
Address:
Building 3, No.12, Wusha Zhenyuan Road, Chang'an Town, Dongguan City, Guangdong Province
Supplier`s last login times:
within 14 hours
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Product Description
CMC-800 Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine is mainly used to clean micro dusts on camera module products such as: Wafer, CMOS, Holder...etc. By using oure DI water scan spray cleaning technology, CMC-800 wash out very little micro dusts and by using 1000RPM centrifugal dry technology, CMC-800 can quickly make products dry.
Machine Features:
1. Specially designed to clean dusts on camera module products.
2. Mirror stainless steel structure, suitable for clean room.
3. Clean plate is specially made according to products, clean plate
can be changed according to different products cleaning
requirement.
4. PLC control, easy operation.
5. Transparent explosion-proof front door, safe operation,
convenient for observation.
6. All machine displayed by meters. Cleaning status are monitoring
at the time.
7. 2 stream clean, high cleaning precise, no damage to products,
very few DI water consumption.
8. Rotate spray rods, no secondary pollution.
9. Equipped with static eliminator, cleaning room heat device, help
to achieve best cleaning result.
10. Equipped with 2-level air filtration system, compressed air
meet the standard of ISO8573.1.
11. Compact machine, smaller foot-print.
12. Use pure DI water, comply with RoHs standard.
Machine Spec:
| Cleaning Plate | Custom-made (cleaning plate diameter<550mm) | |
| Clean method | 2 stream clean | |
| Dry method | High speed centrifugal dry | |
| Power supply | AC380V 50HZ | |
| Power | 7KW | |
| Power consumption | Cleaning power : 3.5kw/h | Standby power: 1kw/h |
| Rotate power | 3HP | |
| Environment filtration method | 0.3μm;99.999% | |
| Air filtration method | 1μm×1;0.01μm×1 | |
| Centrifugal rotating speed | 100-1500RPM | |
| Clean pressure | Water pressure:3-8Kgf/cm² air pressure:0.2-0.5Mpa | |
| DI water supply | Flow rate:>7LPM Resistivity:>17MΩ | |
| Air consumption | Pressure:0.45-0.7Mpa;flow rate:>30m³/H(good cleanness) | |
| DI water let in diameter | ø12mm soft hose or PT1/2″ female joint | |
| Air supply diameter | ø12mm hose | |
| Water exit diameter | PT 1″female joint | |
| Air exit diameter | 4″×2(need air-pumping device, air speed over 3m/sec) | |
| Machine size | 880mm(L)×960mm(W)×1880mm(H) | |
| Machine weight | 450KG | |
Machine picutre:
Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine
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