High Purity 99.95% Tungsten Sputtering Target Sandblasting
Brand Name:Hypersolid Metal
Minimum Order Quantity:Negotiate
Delivery Time:30 days after receiving down payment
Payment Terms:L/C, D/A, D/P, T/T, Western Union, MoneyGram
Place of Origin:China
Price:Negitionable
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Location:
Luoyang China
Address:
Luoyang National University Science and Technology Park
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1,Description:
Material: Tungsten target materials are typically made from high-purity tungsten or tungsten alloys, specifically designed for use in physical vapor deposition (PVD) processes.
High Melting Point: Tungsten has an exceptionally high melting point of approximately 3,422 degrees Celsius (6,191 degrees Fahrenheit), allowing it to withstand the high temperatures generated during PVD processes.
Density: Tungsten target materials have a high density, typically ranging from 17.8 to 19.3 grams per cubic centimeter (g/cm³), ensuring a high deposition rate and efficient material utilization.
2,Specifications:
| Material | High-purity tungsten or tungsten alloys |
| Melting Point | Approximately 3,422 degrees Celsius (6,191 degrees Fahrenheit) |
| Density | 17.8 - 19.3 grams per cubic centimeter (g/cm³) |
| Thermal Conductivity | Excellent thermal conductivity |
| Sputtering Rate | Relatively low sputtering rate, minimal material loss |
| Purity | High levels of purity, minimal impurities |
| Uniformity | Precise dimensions and uniformity for consistent film deposition |
High Purity 99.95% Tungsten Sputtering Target Sandblasting
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