Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition
Brand Name:LONGWAY
Certification:ISO9001
Model Number:YY22353312
Minimum Order Quantity:500 pieces
Payment Terms:D/P,T/T,Western Union
Place of Origin:China
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Shanghai Shanghai China
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Rm. 2111, Bldg. A, Tomson Center, No. 188, Zhangyang Rd., Shanghai, China
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Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition
Material
High-Purity Glass: Typically made from fused silica (JGS1/JGS2), borosilicate, or quartz, selected for ultra-low thermal expansion and chemical inertness.
Fused Silica: Preferred for its exceptional homogeneity, low OH content, and resistance to thermal shock.
Borosilicate: Cost-effective alternative with moderate thermal stability and good surface polishability.
Surface Quality: Engineered with λ/10 to λ/20 flatness to ensure minimal deviation for precision coatings.
Key Properties
Optical Flatness: Surface flatness ≤ λ/10 (at 632.8 nm), critical for uniform thin-film deposition and minimizing wavefront distortion.
Thermal Stability: Low coefficient of thermal expansion (e.g., 0.55 x 10⁻⁶/°C for fused silica) prevents deformation during high-temperature processes like CVD or sputtering.
Chemical Resistance: Inert to acids, plasmas, and solvents, ensuring durability in aggressive deposition environments.
Surface Homogeneity: Refractive index uniformity (±5 x 10⁻⁶) avoids optical distortions in coated films.
Mechanical Durability: High hardness (Mohs 5–7) resists scratching during handling and processing.
Function
Thin-Film Substrate: Provides an ultra-flat, stable base for depositing coatings (anti-reflective, dielectric, metallic).
Process Compatibility: Compatible with PVD, CVD, ALD, and sputtering techniques, ensuring uniform film adhesion and thickness.
Metrology Reference: Serves as a calibration standard for interferometers and surface profilers due to precise flatness.
Applications
Semiconductor Manufacturing: Photomasks, EUV lithography mirrors, and optical MEMS devices.
Optics Industry: Coated filters, beam splitters, and laser optics requiring nanometer-level precision.
Research & Development: Nanotechnology, photonics, and quantum computing experiments.
Aerospace & Defense: Precision sensors, satellite optics, and laser guidance systems.
Medical Devices: Optical coatings for imaging systems, endoscopes, and diagnostic equipment.
| Name | Glass disc, Glass wafer, Glass substrate, Sight glass |
| ofloat | |
| Diameter Tolerance | +0/-0.2 mm |
| Thickness Tolerance | +/-0.2 mm |
| Processed | By Cutting,Grinding, Polishing |
| Working temperature | Resisting high temperature shock |
| Surface Quality | 80/50,60/40,40/20 |
| Material Quality | No scratches and air bubble |
| Transmission | >90% for visible light |
| Chamfer | 0.1-0.5 mm x 45 degree |
| Surface Coating | Available |
| Usage | Photography, Lighting system, industrial area. |
Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition
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