Product Details
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
The RCA clean process is based on a cleaning method developed at
RCA Corporation to remove organic residue from silicon wafers. The
cleaning solution is made up of 5 parts water, 1 part 27% ammonium
hydroxide and 1 part 30% hydrogen peroxide. It removes organic
contaminants and leaves a thin layer of oxidized silicon on the
surface of the wafer.
Silicon Wafer Cleaning feature
1) single group products with perfect PPR(performance price ratio)
2) be free from calcium, magnesium, metal, copper, lead and
phosphor, and meet the requirement of ROHS.
3)good degreasing performance to meet the requirement of
high-accuracy IT area.
Silicon Wafer Cleaning technical parameter
classification project | JH-1020 Silicon Wafer Cleaning | Test Standard |
|
| Appearance | Colorless to yellowish liquid | visualization |
| Specific weight | 1.01-1.25 | densimeter |
| pH | 12.0-14.0 | PH instrument |
| free alkalinity(piont) | ≧13.5mg | CYFC |
Silicon Wafer Cleaning instructions
1) put pure water into cleaning tank till three-quarter, then, add
agent in 3% -5% concentration, add water till working level, last,
heat the bath solution till working temperature.
2) need to change bath solution completely after degreasing certain
amount silicon slice.
3) reduce exposed time in air to avoid oxidation.
4) working temperature 50-65 degree, disposal time: 2-5minutes.
Company Profile
Changzhou Junhe Technology Stock Co., Ltd. is a high-tech enterprise devoted to developing industrial fine
chemicals, special equipment and services solution provider which
was founded in Changzhou, Jiangsu in 1998.
Zinc flake microlayer corrosion protection coating is one of our
core products, our company draw on the experience and lesson of
dacromet coating technology from Japan and USA, investing millions
on R&D, after 20 years application and diffusion, Junhe zinc
flake microlayer corrosion protection coating already become one of
the leading brand in China.
Our company have three industrial base: chemical production base,
equipment production base, coating job processing base.

Equipment Production Base

Chemical Production Base

Coating Job Processing Base
Company research and development center is located in changzhou
national hi-tech zone, owns 15 acres of land for construction and
is built around five categories of chemicals and equipment research
and development and incubation bases, equipped with standardization
on the basis of the experimental equipment and testing equipment of
the company's marketing center and two functional departments in
the changzhou new north area to create building, the company's
three big center and subsidiary system solution for customer demand
to provide a solid foundation. The company has passed ISO9001 and
TS16949 system certification.
Our Qualification








