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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

Brand Name:JUNHE
Certification:ISO9001 TS16949 SGS
Model Number:1020
Minimum Order Quantity:500 Kilograms
Delivery Time:Ten days after receipt of advance payment
Place of Origin:Changzhou in china
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Location: Changzhou
Address: 20F Zhongchuang Budg.,Times Commerce Plaza, 396 Tongjiang Ave, Changzhou
Supplier`s last login times: within 37 hours
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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance


The RCA clean process is based on a cleaning method developed at RCA Corporation to remove organic residue from silicon wafers. The cleaning solution is made up of 5 parts water, 1 part 27% ammonium hydroxide and 1 part 30% hydrogen peroxide. It removes organic contaminants and leaves a thin layer of oxidized silicon on the surface of the wafer.


Silicon Wafer Cleaning feature


1) single group products with perfect PPR(performance price ratio)

2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.

3)good degreasing performance to meet the requirement of high-accuracy IT area.


Silicon Wafer Cleaning technical parameter


classification

project

JH-1020 Silicon Wafer CleaningTest Standard
AppearanceColorless to yellowish liquidvisualization
Specific weight1.01-1.25densimeter
pH12.0-14.0PH instrument
free alkalinity(piont)≧13.5mgCYFC

Silicon Wafer Cleaning instructions


1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -5% concentration, add water till working level, last, heat the bath solution till working temperature.

2) need to change bath solution completely after degreasing certain amount silicon slice.

3) reduce exposed time in air to avoid oxidation.

4) working temperature 50-65 degree, disposal time: 2-5minutes.



China IT Industry Silicon Wafer Cleaning With Good Degreasing Performance supplier

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

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