Fully Automatic Wafer Thinning Machine Si SiC GaN Ultra-thin Wafer Grinding

Brand Name:ZMSH
Place of Origin:China
Wafer Size:2" 4" 6" 8"12"
Thinning Range:20μm - 800μm
Spindle Speed:500 - 6000 rpm
Cooling System:Water + Air Cooling
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Location: Shanghai Shanghai China
Address: Room.1-1805,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
Supplier`s last login times: within 38 hours
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Product Details

Product Introduction

The wafer thinning machine is a critical tool in semiconductor fabrication, designed to reduce wafer thickness through precise back grinding and polishing. This wafer thinning machine ensures high uniformity and surface quality, making it suitable for materials such as silicon, GaAs, GaN, and SiC. It plays an essential role in applications like power devices, MEMS, and CMOS image sensors.

Working Principle

The wafer thinning machine operates by securing the wafer and engaging it with a high-speed rotating grinding wheel. This wafer thinning machine incorporates advanced control systems to monitor grinding pressure and thickness in real time, ensuring stable and reliable thinning. Integrated cooling and cleaning mechanisms improve processing yield and minimize damage.


Wafer Thinning Machine Specification


ParameterSpecificationRemarks
Wafer SizeØ2" to Ø12" (Optional: Ø8" and above)Supports up to 300mm
Thinning Range50μm - 800μmMinimum possible thickness: 20μm (depends on material)
Thickness Accuracy±1μmWith optional in-line thickness measurement
Surface Roughness<5nm Ra (after fine grinding)Depends on material and wheel type
Grinding Wheel TypeDiamond Cup WheelReplaceable
Spindle Speed500 - 6000 rpmStepless speed control
Vacuum ChuckSupportedPorous ceramic vacuum chuck
Cooling SystemWater + Air CoolingPrevents thermal damage
Operation ModeTouchscreen with PLC ControlParameters adjustable and programmable
Optional FeaturesAuto loading/unloading, thickness monitor, CCD alignmentCustomizable
Power SupplyAC 380V ±10%, 50/60Hz, 3-phaseCustom voltage options available
Machine DimensionsApprox. 1800mm × 1500mm × 1800mmMay vary slightly by model
WeightApprox. 1500 kgWithout auto-handling system

Applications

The wafer thinning machine is widely used in various semiconductor manufacturing processes where ultra-thin wafers are required, such as 3D IC packaging, power device fabrication, image sensors, and RF chips. The wafer thinning machine is often paired with post-thinning processes like backside metallization to provide a complete thinning solution.

In addition, the wafer thinning machine is applicable in the following scenarios:

  • Advanced Packaging: Including FO-WLP, 2.5D, and 3D packaging, where thinner wafers enable higher integration and shorter interconnects.

  • MEMS Device Fabrication: Wafer thinning improves sensor sensitivity by releasing the structural layer.

  • Power Semiconductor Devices: Materials like SiC and GaN require wafer thinning to reduce conduction loss and improve heat dissipation.

  • LiDAR Chips: Wafer thinning supports better optical alignment and electrical performance.

  • R&D and Academia: Universities and research institutions use the wafer thinning machine to explore semiconductor structures and verify new materials.


Q&A

Q1:What materials can be processed by this wafer thinning machine?
A1:Our wafer thinning machine is compatible with a wide range of materials, including silicon (Si), silicon carbide (SiC), gallium nitride (GaN), sapphire, gallium arsenide (GaAs), and more.


Q2: How does this wafer thinning machine ensure uniform thickness?
A2: It uses a precision grinding head with real-time thickness monitoring and adaptive control systems to maintain consistent thinning results.


Q3: What is the thickness range of this wafer thinning machine?
A3: Wafers can be thinned to 50μm or even thinner, depending on the material and application requirements.


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