Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
Brand Name:Brother Furnace
Certification:CE
Model Number:BR-PECVD
Minimum Order Quantity:1 Set
Delivery Time:7-21 Working days
Payment Terms:L/C, T/T, Western Union
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Location:
Zhengzhou Henan China
Address:
Building 10, Henan National University Science and Technology Park, Zhengzhou, China.
Supplier`s last login times:
within 29 hours
Product Details
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Product Details
Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200
Degree
Intelligent PECVD Introduction:
PECVD system is designed to decrease the reaction temperature of
traditional CVD. It installed RF induction equipment in front of
traditional CVD to ionize reacting gas, so the plasma is generated.
Plasma's high activity is Reaction is accelerated due to the high
activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of
most tube PECVD systems, and added a pre-heating zone in the front
of the PECVD system. Tests showed that the deposition speed is
quicker, the film quality is better, holes are less, and won't
crack. AISO fully automatic intelligent control system is
independently designed by our company, it is more convenient to
operate and its function is more powerful.
Wide application range: metal film, ceramic film, composite film,
the continuous growth of various films. Easy to increase function,
can expand plasma cleaning etch and other functions
Main Feature:
- High film deposition rate: RF glow technology, greatly increasing
the deposition rate of the film, the deposition rate can reach 10Å
/ S
- High area uniformity: Advanced multi-point RF feeding technology,
special gas path distribution, and heating technology, etc., make
the film uniformity index reach 8%
- High consistency: using the advanced design concept of the
semiconductor industry, the deviation between the substrates of one
deposition is less than 2%
- High process stability: Highly stable equipment ensures a continuous and stable process
Standard Spares:
- Plugging tube 4 pcs
- Furnace tube 1 pc
- Vacuum pump 1 pc
- Vacuum sealing flange 2 sets
- Vacuum gauge 1 pc
- Gas delivery & vacuum pump
- RF plasma equipment
Optional Spares:
- Quick release flange, Three-way flange
- 7 inch HD touch scree
Plasma Enhanced Chemical Vapor Deposition Furnace Standard specification:
| 1. Heating System | ||
| Max.temperature | 1200℃ (1 hour) | |
| Working temperature | ≤1100℃ | |
| Chamber size | Φ100*1650mm (Tube diamater is customizable) | |
| Chamber material | High purity alumina fiber board | |
| Thermocouple | K type | |
| Temperatureaccuracy | ±1℃ | |
| Temperature control | ● 50 programmable segments for precise control of heating rate, cooling rate and dwell time. ● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection. ● PLC automatic control system by PC controller inside. ● The temperature control system, sliding system (Time and Distance) could be controlled by program. | |
| Heating length | 440mm | |
| Constant heating length | 200mm | |
| Heating element | Resistance wire | |
| Power supply | Single phase, 220V, 50Hz | |
| Rated power | 9kW | |
| 2. RF Plasma Source | ||
| RF frequency | 13.56 MHz±0.005% | |
| Output power | 500W | |
| Max reflect power | 500W | |
| RF output interface | 50 Ω, N-type, female | |
| Power stability | ±0.1% | |
| Harmonic component | ≤-50dbc | |
| Supply voltage/Frequency | Single phase AC220V 50/60HZ | |
| Whole efficiency | >=70% | |
| Power factor | >=90% | |
| Cooling method | Forced air | |
| 3. Three precision mass flowmeters control system | ||
| External dimension | 600x600x650mm | |
| Connector type | Swagelok SS joint | |
| Standard range (N2) | 0~100sccm, 0~200sccm, or customizable | |
| Accuracy | ±1.5% | |
| Linear | ±0.5～1.5% | |
| Repeatability | ±0.2% | |
| Response time | Gas property: 1～4 Sec; | |
| Pressure range | 0.1～0.5 MPa | |
| Max.pressure | 3MPa | |
| Interface | Φ6,1/4'' | |
| Display | 4 digit display | |
| Ambient temperature | 5~45 high purity gas | |
| Pressure gauge | －0.1～0.15 MPa, 0.01 MPa/unit | |
| Stop valve | Φ6 | |
| Polish SS tube | Φ6 | |
| Low vacuum system included | ||
Why Brother's Lab Plasma Enhanced Chemical Vapor Deposition Furnace?
- Manufacturer with 10+ years' experience
- Best quality
- Customized design
- Experienced workers
- Big factory
Customers from more than 30 countries choose us
- Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.
Best service, Fast response
- Free design for special furnace
- Free technical support for the lifetime
- Free sample test
If you're interested in our Plasma Enhanced Chemical Vapor Deposition Furnace, contact us now to get a quote!
Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
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