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1,Principles
It is the new generation of the beatify treatment machine that
combined the two major functions of transmission of electromagnetic
waves and pulse ray. It is different from the laser or other light
treatment that its cardinal work is the use of pulse ray of
multiwavelength and transmission of electromagnetic waves absorbed
by pathological tissues. Then converted the electromagnetic energy
into light and heat energy, and stimulates the activation collagen
mother cells to make the skin rearrange, collagen albumen reproduce
and the grain of skin rebuild. At the same time it can improve the
bulky pore, so as to reach the effect if tightening skin from inner
to exterior. Improving not equality color of skin and make your
skin return young.
2. Function
1> it can stimulate the collagen mother cell to live to make it
reproduce collagen albumin, and close the skin , reduce the
wrinkles.
2> It can tighten pore to make your skin appears pink ,
tendering and smooth skin like silk
3> End the condition of skin that dim, not equality.
4> Removing the speckles of shallow layer, and at the same time
it can remove the dermal flecks .the effect to the sunburn, flecks,
age pigment is also obvious.
5> To panda eye say goodbye.
6> Improve all kinds of silk blood vessel
3,Before and after:
Hair removal
Pigment and skin spots:
4, Specification
Parameters | Data |
| |
Line voltage: | 115VAC or 230VAC (see system label) |
Line frequency: | 50/60Hz |
Maximum power | 2000W |
| |
Protection against electric shock category: | I equipment |
Protection against electric shock degree: | BF equipment |
Protection against harmful water degree: | Common equipment |
| |
Ambient temperature | +15℃ to +30℃ |
Relative humidity | 30% to 80% |
Barometric pressure | 86.0 kpa to 106.0kpa |
| |
Ambient temperature | +5℃ to +55℃ |
Relative humidity | 30% to 80% |
Barometric pressure | 86.0 kpa to 106.0kpa |
| |
Height | 47cm 71*55*47cm3 |
Width | 55cm |
Depth | 71cm |
Weight | 40Kg |
| |
Light source | Intense pulsed light (xenon lamp) |
Spectral region | 420-1200nm |
Energy density | 0~60J/c㎡ |
Pulse mode | Strong pulse technology (adjustable) |
| |
Cooling system | Water cooling, forced air cooling and semiconductor cooling |
Cooling temperature | -4°c~+10°c |