TaN Ta2O5 Optical Films Magnetron Sputtering Deposition System , Ion Beam Assistant Deposition

Brand Name:ROYAL
Certification:CE
Model Number:RTSP1200
Minimum Order Quantity:1 set
Delivery Time:8 to 12 weeks
Payment Terms:L/C, T/T
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Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
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Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc.

Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

Applications of Sputtered Tantalum thin film:
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

  1. Medical instruments like body implants for its highly biocompatability property;
  2. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;
  3. Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defected and is adherent to the substrate is intended to protect.

5. Semi-conductor industry, micro-electronic chips


Technical Advantages

  1. A standardized trolley is applied which allows easy and safe loading/unloading of the substrate holders and work pieces in/out of the deposition chamber
  2. The system is safety interlocked to prevent incorrect operation or unsafe practices
  3. The substrate heaters are provided which mounted in the center of chamber, PID controlled thermocouple for high accuracy, to enhance the condense film’s adhesion
  4. Strong vacuum pumps configurations with Magnetically suspension molecular pump via gate valve connected to chamber; backed with Leybold’s roots pump and two stage rotary vane pump, mechanical pump.
  5. High energy ionized plasma source is applied with this system to guarantee the uniformity and density.



Royal Technology’s standardized Tantalum sputtering deposition system: RTSP1000

Main Configurations
MODELRTSP1200
TECHNOLOGY

Pulsed DC magnetron sputtering

Cathodic arc plating (for option, determined by coating process), ion beam source

CHAMBER MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1200*1300mm (H)
CHAMBER TYPED shape, cylindrical chamber
ROTATION RACK & JIG SYSTEMSatellite driving or central driving system
POWER SUPPLIES

DC Sputtering Power Supply: 2~4 sets
Bias Power supply: 1 set

Ion Source: 1 set

DEPOSITION MATERIALTa, Ti/Cr/TiAl, Au, Ag, Cu etc.
DEPOSITION SOURCEPlanar Sputtering Cathodes + circular arc cathodes
CONTROLPLC(Programmable Logic Controller) + IPC
( manual+ auto+ semi-auto operation models)
PUMP SYSTEMRotary Vane Pump: SV300B – 1 set (Leybold)
Roots Pump: WAU1001 – 1 set (Leybold)
Holding Pump: D60C – 1 set (Leybold)
Magnetic Suspension Molecular Pump:
MAG2200 – 2 sest (Leybold)
GAS MASS FLOW CONTROLLER2 channels: Ar and N2
VACUUM GAUGEInficon or Leybold
SAFETY SYSTEMNumerous safety interlocks to protect operators and equipmen
HEATINGHeaters: 20KW. Max. temp.: 450℃
COOLINGIndustrial Chiller (Cold Water)
POWER MAX.100KW (Approx.)
AVERAGE POWER CONSUMPTION45 KW (Approx.)
GROSS WEIGHTT (Approx.)
FOOT PRINT( L*W*H) 4000*4000 *3600 MM
ELECTRICAL POWER

AC 380V/3 phases/50HZ / 5 line


Please contact us for more applications and specifications.

China TaN Ta2O5 Optical Films Magnetron Sputtering Deposition System , Ion Beam Assistant Deposition supplier

TaN Ta2O5 Optical Films Magnetron Sputtering Deposition System , Ion Beam Assistant Deposition

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