CsI High Vacuum Deposition System -RT-CsI950

Brand Name:ROYAL
Certification:CE
Model Number:RT950-CsI
Minimum Order Quantity:1 set
Delivery Time:10 to 12 weeks
Payment Terms:L/C,T/T
Contact Now

Add to Cart

Verified Supplier
Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
Supplier`s last login times: within 1 hours
Product Details Company Profile
Product Details

CsI High Vacuum Deposition System is exclusively designed for CsI metallization on scintillation screens in an extremely high vacuum environment.

The CsI scintillators 200~600µm in thickness ranges with high uniformity of thickness and brightness performance.

Cesium Iodide (CsI ) Deposition characterizations:
Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose;

Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.
Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate

Equipment Features:

Reliability:
24/7 days non-stop operation;
Inficon Film Thickness Controller to monitor the film thickness inline.
Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
Rotary racks equipped with Servo-Motor for high accuracy and stability.


Safety:

High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
All electrodes are equipped with safety protection sleeves.

Repeatability & Reproducibility:
Through high precised parameter control system,
Automated process control software and program,
User friendly operation.


Efficiency:
CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
Double-capacity for max. size substrate: 500 x400mm.

Technical Specifications

Description

RT-CsI950


RTEP800

Deposition chamber (mm)

φ950 x H1350

φ800 x H800

Capacity

2

1

Evaporation sources

2

4

Dry and Dehumidity

Iodine tungsten lamp

Max. 300℃

Iodine tungsten lamp

Max. 200℃

Ultimated vacuum pressure (Pa)

8.0×10-5Pa

5.0×10-4Pa

Deposition Film Thickness Controller

Quartz Control x 1

NONE

Power Consumption (KW)

Max. approx. 50

Average approx. 20

Max. approx. 20

Average approx. 10

Footprint (L*W*H)

3000*2150*2100mm

1800*2300*2100mm

Operation & Control System

CE standard

Mitsubishi PLC+ Touch Screen

Operation Program with backup

In addition to the RT-CsI950 equipment, we also provide its post-processing machines which to generate protective layer on the top of CsI film.

-- RTEP800, which is using the thermal evaporation coating technology. Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


China CsI High Vacuum Deposition System -RT-CsI950 supplier

CsI High Vacuum Deposition System -RT-CsI950

Inquiry Cart 0