Tantalum Sputtering Coating Machine

Brand Name:ROYAL
Certification:CE
Model Number:RTSP
Minimum Order Quantity:1 set
Delivery Time:14~16weeks
Place of Origin:China
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Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
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Product Details

Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating


Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.


Sputtered tantalum films are widely used in the
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

2. Medical instruments like body implants for its highly biocompatability property;

3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;


Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected and is adherent to the substrate is intended to protect.


RTAS1000 Technical Advantages


1. Plug-in Integrated design system for quick installation

2. Siemens PLC,CPU; with Industrial PC operation & control hardware

3. Available for remote monitoring and diagnosis.
4. Flexible, ready for upgrading

5. Multiple cathodes for fast deposition speed


More benefits from the machine:


Robust Design, Stable Quality, Fast Cycle, Fast Cycle Time, High deposition speed


Main Configurations
MODELRTAS1000
TECHNOLOGYDC magnetron sputtering + Cathodic arc plating
CHAMBER MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1000*1000mm (H)
CHAMBER TYPED shape, cylindrical chamber
ROTATION RACK & JIG SYSTEMSatellite driving or central driving system
POWER SUPPLIESDC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets
DEPOSITION MATERIALTi/Cr/TiAl, Ta, Au, Ag, Cu etc.
DEPOSITION SOURCE

Planar Sputtering Cathodes + circular arc cathodes

Remark: cylinderial DC sputter is avaliable

CONTROLPLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEMRotary Vane Pump: SV300B - 1 set (Leybold)
Roots Pump: WAU1001 - 1 set (Leybold)
Holding Pump: D60C - 1 set (Leybold)
Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold)
GAS MASS FLOW CONTROLLER4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2)
VACUUM GAUGEModel: ZDF-X-LE, Made in China
SAFETY SYSTEMNumerous safety interlocks to protect operators and equipmen
HEATINGHeaters: 20KW. Max. temp.: 450℃
COOLINGIndustrial Chiller (Cold Water)
POWER MAX.100KW (Approx.)
AVERAGE POWER CONSUMPTION45 KW (Approx.)
GROSS WEIGHTT (Approx.)
FOOT PRINT( L*W*H) 4000*4000 *3600 MM
POWER ELECTRICALAC 380V/3 phases/50HZ / 5 line

Cylindrical sputtering cathodes Planar sputtering cathodes



Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


Download the brochure, please click here: Magnetron Sputtering Deposition System.pdf
Magnetron Sputtering Deposition system applicatio...

China Tantalum Sputtering Coating Machine supplier

Tantalum Sputtering Coating Machine

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