Balance / Unbalanced Closed Magnetron Sputtering Coating Machine , Direct Plated Copper Magnetron Sputtering System

Brand Name:ROYAL
Certification:CE certification
Model Number:RT1215-SP
Minimum Order Quantity:1
Delivery Time:16 weeks
Place of Origin:Made in China,
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Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
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Product Details

Balance/Unbalanced Closed Magnetic Filed Sputtering Coating System, Direct Plated Copper Vacuum Sputtering Plant


The Mangetron Sputtering Coater RTSP1215 is esigned for copper, alumunium, plastic, metal circuit board conductive film layer plating. It can condense Nano thin film on substrates. Except Ag sputtering, it can also deposit Ni, Au, Ag, Al, Cr, SS316L.


The RTSP1215 machine is installed with 2 pairs of MF sputtering cathodes on chamber, before PVD film deposition and 1 set of Anode Layer Ion source for plasma bombardment cleaning.


Ion source is original from Gencoa company, the properties:


1. Optimized magnetic fields to produce a collimated plasma beam at standard sputtering pressures

2. Automated regulation for the gas to maintain constant current & voltage – multi-gas auto control

3. Graphite anode and cathode to protect the substrate from contamination and provide long-life components

4. RF standard electrical insulation on all ion sources

5. In-direct cooling of anode and cathode – quick switching of parts

6. Easy switching of cathode parts to provide multiple magnetic traps for lower voltage operation, or a focused beam

7. Voltage regulated power supply with gas adjustment feedback to maintain same current at all times


RTSP1215 Sputtering Coating Equipment Applications:


1. Available on substrates of: Plastic, Polymer, Glass and ceramic sheets, Stainless steel, Copper sheet, Aluminum board etc.


2. To generate Nano film like: TiN, TiC, TiCN, Cr, CrC, CrN, Cu, Ag, Au, Ni, Al etc.


RTSP1215 Sputtering Coating Equipment Design Features:


1. Robust design, good for limited room space

2. Easy access for maintenance and repair

3. Fast pumping system for high yield

4. CE standard electrical enclosure, UL standard is also available.

5. Accurate fabrication workmanship

6. Stable running to guarantee high quality film production.


The key feature is that Royal's customized operation and control program and software, which is available to meet various requests from customer's demands. The control system is PLC + Touch screen:


PLC remote monitoring and control ( Local Area Network )

1) Remote control Team View Program

2) PLC program back up + HMI program back up

3) PC operating environment
System:Window 2000/Window XP/Window 7
Display Pixel:1920*1080


Configurations


MODELRTSP1215
MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1200*1500mm (H)
CHAMBER TYPE1-door structure, Vertical
SINGLE PUMP PACKAGERotary VaneVacuum Pump
Roots Vacuum Pump
Magnetic Suspension Molecular Pump
Two-stage rotary vane vacuum pump
TECHNOLOGYMF Magnetron Sputtering, Linear Ion Source
POWER SUPPLYSputtering power supply + Bias Power supply + Ion Source
DEPOSITION SOURCE2 pairs MF Sputtering Cathodes + Ion Source
CONTROLPLC+Touch Screen
GASGas Mass Flow Meters ( Ar, N2, C2H2, O2) Argon, Nitrogen and Ethyne,Oxygen
SAFETY SYSTEMNumerous safety interlocks to protect operators and equipment
COOLINGCooling Water
CLEANINGGlow Discharge/Ion Source
POWER MAX.120KW
AVERAGE POWER CONSUMPTION70KW


Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

China Balance / Unbalanced Closed Magnetron Sputtering Coating Machine , Direct Plated Copper Magnetron Sputtering System supplier

Balance / Unbalanced Closed Magnetron Sputtering Coating Machine , Direct Plated Copper Magnetron Sputtering System

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