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Pvd Titanium Nitride Coating Machine , Vacuum Flask Magnetron Sputtering System

Pvd Titanium Nitride Coating Machine , Vacuum Flask Magnetron Sputtering System

Brand Name:ROYAL
Certification:CE
Model Number:RTSP-1618
Minimum Order Quantity:1 set
Delivery Time:8 to 14 weeks
Payment Terms:L/C, T/T
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Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
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Vacuum Flask Copper Magnetron Sputtering System / Vacuum Flask PVD Cooper Deposition


Magnetron Sputtering Technology which represents a real alternative to
definitively substitute Chrome/Silver/Gold electroplating coating onto metals/ceramics/
resin/plaster/glass and plastic materials which is considered to be a strong pollutant and a health hazard.

The most important is the added value brings to producers. The Sputtering PVD processes
enable almost unlimited production of coatings on any type of complex surface. Mostly, for
aesthetic (decorative), functional coating applications.


Vacuum Flask Copper Magnetron Sputtering System


RTSP1618 is designed and produced exclusively for vacuum flask cooper deposition. The depositing layer thickness is up to 2~3 microns which gives extremely good thermal heat preservation.


When add the cathodic arc sources, it can be used for vacuum flask exterior coating to generate various decorative colors: black, gold, blue, rainbow etc.


Vacuum Flask Copper Magnetron Sputtering Technology Advantages
1. It is totally economically efficient generating the thinnest and most uniform coating films;
2. It is a dry coating process at low temperature in a vacuum chamber;
3. It offers great versatility, can be used for the deposition of conductive or non-conductive materials on any type

of substrates, like: metals, ceramics, plastic materials.
4. Multi layers coating are available.


Vacuum Flask Copper Magnetron Sputtering System Coating targets:

Chrome , Nickel, Silver, Gold, Titanium targets are applied to generate the high quality thin films on
plastic parts.


MODELRTSP-1618
MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1600*1800mm (H)
PUMP SYSTEMRotary Piston Vacuum Pump
Rotary Vane Vacuum Pump
Roots Vacuum Pump
Diffusion Pump
TECHNOLOGYMagnetron Sputtering Coating+Glow discharging
CONTROLPLC(Programmable Logic Controller) + Touch Screen
GASGas Mass Flow Meters
SAFETY SYSTEMNumerous safety interlocks to protect operators and equipment
COOLINGWater
CLEANINGPlasma Source
POWER MAX.145KW
AVERAGE POWER CONSUMPTION70KW


China Pvd Titanium Nitride Coating Machine , Vacuum Flask Magnetron Sputtering System supplier

Pvd Titanium Nitride Coating Machine , Vacuum Flask Magnetron Sputtering System

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